and a third device which does measuring to the thickness of the photoresistor of the wafer arranged on the sucking disc (2).
以装置(5),对安装在吸盘(2)上的晶片的光敏电阻的厚度进测定。
and a third device which does measuring to the thickness of the photoresistor of the wafer arranged on the sucking disc (2).
以装置(5),对安装在吸盘(2)上的晶片的光敏电阻的厚度进测定。
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