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Sometimes engineers will use chemicals to clean up of the master on the photoresist or chemical substance, such as hydrogen peroxide, acetonic.

师会拔取一些化学品去纯不母盘上的平刻或化学精神,水,丙酮。

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Crash Course

Where the mask blocks the light, the photoresist is unchanged.

阻挡光线的地方,光刻胶没有变化。

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智慧坊

The wafer is then sent through a hard bake to harden the remaining photoresist.

然后将晶圆送去进行硬烘烤,以使剩余的光刻胶变硬

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TED-Ed(视频版)

Then, a liquid called " photoresist" is spun on and baked to harden.

接着,一种名为“光刻胶的液体被均匀涂抹并烘烤硬化。

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智慧坊

Wherever the light from  the stencil touches the wafer, the photoresist is weakened.

板上的光线接触到晶圆时,光刻胶就会被削弱。

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TED-Ed(视频版)

In the lit areas, a reaction weakens the photoresist's chemical bonds.

区域,反应会削弱光刻胶的化学键。

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Crash Course

To clean up, we use yet another special chemical that washes away any remaining photoresist.

为了清理,们使用了另一种特殊的化学物质来洗掉所有残留的光刻胶

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Crash Course

Note that the oxide layer under the photoresist is protected.

请注意,光刻胶下方的氧化层受到保护。

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TED-Ed(视频版)

And new problems arise: today, PFAS-based photoresists are essential to make ever-smaller features.

新的问题出现了:如今,基于PFAS的光刻胶对于制造越来越小的特征至关重要。

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Crash Course

Once again, we wash away remaining photoresist.

们再次洗掉剩余的光刻胶

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Crash Course

Photoresists aren’t very useful by themselves, but are super powerful when used in conjunction with a photomask.

光刻胶本身不是很有用,但与光结合使用时非常强大。

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TED-Ed(视频版)

The wafer is doused in another chemical to wash away that weakened photoresist, leaving an image of the mask.

晶圆会被另一种化学物质冲洗, 以清除那层被削弱的阻剂留下的图像。

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Crash Course

Once more, we apply a photoresist, and use a new photomask to etch little channels.

再一次,们应用光刻胶并使用新的光来蚀刻小通道。

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智慧坊

Next the  wafer is sent to a photoresist stripper where the mask layer is removed.

接下来,晶圆被送往光刻胶剥离器,去除层。

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Crash Course

The process essentially starts again, first by building up a fresh oxide layer ...which we coat in photoresist.

这个过程基本上又开始了,首先是建立一个新的氧化层… … 上面涂上光刻胶

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智慧坊

Next, using UV Light and a stencil, a pattern is applied to the photoresist.

接下来,使用紫外线和板将图案应用到光刻胶

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智慧坊

These tools include the  photoresist spin coater, photolithography tool, developer and photoresist stripper.

这些工具包括光刻胶旋涂机、光刻胶工具、显影剂和光刻胶剥离剂。

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智慧坊

The wafer then goes to the developer  and the weakened photoresist is washed away, leaving only the patterned nanoscopic stencil on  the wafer.

然后, 晶圆进入显影剂, 弱化的光刻胶被洗掉,只晶圆上留下图案化的纳米级板。

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智慧坊

Next photoresist is  spread across the surface and the wafer is sent through a soft bake to remove the solvent.

接下来,将光刻胶涂抹表面,并将晶圆送去软烘烤以去除溶剂。

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Crash Course

So, very similar to before, we apply a photoresist, use a photomask, dissolve the exposed resist, and use a chemical to remove any exposed metal.

因此,与之前非常相似, 们应用光刻胶 使用光, 溶解暴露的抗蚀剂,并使用化学物质去除任何暴露的金属。

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智慧坊

To start, a layer of insulating silicon dioxide is deposited  on top of the wafer and then a layer of light sensitive photoresist is spread across the top.

首先,晶圆顶部沉积一层绝缘二氧化硅,然后顶部涂上一层感光光刻胶

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